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io-port 05450177 Yamamoto, S.; Kure, T.; Ohgo, M.; Matsuzawa, Teruo; Tachi, S.; Sunami, H.

A two-dimensional etching profile simulator: ESPRIT. (English)

IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst. 6, No. 3, 417-422 (1987).

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io-port 05449172 Ohgo, M.; Takano, Y.; Moniwa, A.; Yamamoto, S.; Sakai, Y.; Masuda, H.; Sunami, H.

A two-dimensional integrated process simulator: SPIRIT-I. (English)

IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst. 6, No. 3, 439-445 (1987).

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io-port 05449084 Moniwa, A.; Matsuzawa, Teruo; Ito, T.; Sunami, H.

A three-dimensional photoresist imaging process simulator for strong standing-wave effect environment. (English)

IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst. 6, No. 3, 431-438 (1987).

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io-port 05448895 Matsuzawa, Teruo; Moniwa, A.; Hasegawa, N.; Sunami, H.

Two-dimensional simulation of photolithography on reflective stepped substrate. (English)

IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst. 6, No. 3, 446-451 (1987).

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