io-port 50234568 Rothschild, A.;
Mitsuhashi, R.;
Kerner, C.;
Shi, X.;
Everaert, J. L.;
Date, L.;
Conard, Thierry;
Richard, Olivier;
Vrancken, C.;
Verbeeck, R.;
Veloso, A.;
Lauwers, A.;
De Ten Broeck, M. De Potter;
Debusschere, I.;
Jurczak, M.;
Niwa, M.;
Absil, P.;
Biesemans, S.
Optimization of hfsion using a design of experiment (DOE) approach on 0.45 V $V_{t}$ ni-FUSI CMOS transistors (English)
Microelectronics Reliability 47, No. 4-5, 521-524 (2007).
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